測試模組
Tencor Sono Gauge 300
Tencor P-10表面台階儀
Specifications
Measurement of roughness, waviness, step height on a surface | ||
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Vertical Resolution | : | 1 Å (Max. vertical range 13μm), 25 Å (Max vertical range 300μm) |
Horizontal Resolution | : | 0.01 μm at 1μm/s scan speed |
Max. Scan Length | : | 60 mm, 2-D scan only |
Scan Speed | : | 1 μm/s to 25 mm/s |
Stylus Force | : | 1-100 mg |
Stylus Radius | : | 12.5 μm |
Display Magnification | : | 60-240x |
KLA-Tencor P-7表面台階儀
Specifications
Measurement of roughness, waviness, step height on a surface | ||
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Vertical Resolution | : | 1 Å (Max. vertical range 13μm), 25 Å (Max vertical range 300μm) |
Horizontal Resolution | : | 0.025 μm |
Max. Scan Length | : | 150 mm, 2-D scan only |
Scan Speed | : | 2 μm/s to 25 mm/s |
Stylus Force | : | 0.5-50 mg |
Stylus Radius | : | 2 μm |
Display Magnification | : | 60-240x |
Dektak 150 Veeco表面台階儀
Specifications
Measurement of roughness, waviness, step height on a surface | ||
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Stylus Force | : | 1 to 15mg with LIS 3 sensor |
Stylus Radius | : | 2.5 μm and 12.5 μm |
Scan Length Range | : | 55mm |
Sample Stage | : | Manual Θ, 360° rotation, manual leveling, auto X-Y 150 mm travel, 1 μm repeatability, 0.5 μm resolution |
Data Points Per Scan | : | 60,000 maximum |
Max. Sample Thickness | : | Up to 100 mm |
Max. Wafer Size | : | 150 mm |
Step Height Repeatability | : | 6A, 1 sigma on 1μm step |
Vertical Range | : | 524 μm standard |
Vertical Resolution | : | 1A max. (at 6.55 μm range) |
Four Dimension 280C四點探針台
Lucas Pro4-640R電阻率測量系統
NANOmetrics Nanospec AFT Model 4150 / 3000
Specifications
Single film thickness measurement on silicon substrate: | ||
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Silicon dioxide, Silicon nitride, positive/negative photo resist and polymide | ||
Double layers measurement on silicon substrate : | ||
Silicon nitride on silicon dioxide, Polysilicon on silicon dioxide, Amorphous silicon on silicon dioxide, Negative/positive resist on silicon oxide | ||
Standard visible system with Lens in 10x magnification | ||
Measuring light spot size | : | 15 μm (Model 4150) |
25 μm (Model 3000) | ||
Automatic focusing and preset pattern of measurement point locations (Model 4150) |
J.A. Woollam M-2000VI 光譜型橢偏儀
Specifications
Measure the optical constants: refractive Index, extinction coefficients and film Thickness for different materials | ||
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Wavelength | : | 370 nm to 1690 nm, ~ 580 wavelengths |
All wavelengths are acquired simultaneously | ||
Focused beam diameter in ~200 μm (collimated) | ||
Spectral resolution in 1.6 nm, 5 nm bandwidth | ||
Test Base fixed angle of 66°, horizontal sample stage for 100 mm wafer | ||
Automated z-height alignment |
XE150S原子力顯微鏡
SMSi 3800膜應力測量系統
Specifications
Measure the change of curvature induced in a sample due to the deposited film on a reflected substrate | ||
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Measure 1-D stress and produce 3-D topographical profile | ||
For wafer flatness and Pattern measurement | ||
Various of stress constant | ||
Wafer size | : | 2" to 8" |
Thickness Limit | : | less than 11 mm |
Statistical process control and spreadsheet compatibility | ||
Automatic segmentation calculation |
形狀測量激光顯微系統
Specifications
Keyence VK-X260K 3D Laser Confocal Microscope provides non-contact, nanometer-level profile, roughness, and film thickness data on any material. | ||
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Light source | : | 408nm violet laser source White light source |
Total magnification | : | Up to 28000x |
Optical microscope | : | Pinhole confocal optical system 4 Objectives (10X, 20X, 50X & 150X) |
Light receiving element | : | 16-bit photomultiplier |
Scanning method | : | Automatic upper/lower limit setting High-speed light intensity optimization (AAGII) Poor reflected light intensity supplement (Double Scan) |
Stage | : | Manual XY Stage 70mm×70mm Micrometric motorized Z translation |
Resolution | : | 1nm lateral resolution 0.5nm Z-axis movement of objective lenses |
Observation image | : | Super-high-resolution color CCD image 16-bit laser color confocal image Confocal + ND filter optical system C-laser differential interference image |
Sample size | : | Up to 5" Maximum sample height 28mm |
Perfict Lab Probe Station with Keysight B1500A Analyzer 探針台連分析儀
Specifications
Probing Stage: | ||
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Sample size | : | Up to 152.4 mm (6 inch) |
Probe: | ||
Probe Tip Holder | : | Triaxle cable Current leakage: <50 fA |
Probe Tip diameter | : | 20 μm |
Stereo Microscope: | ||
Optical Magnification | : | 20X – 400X |
Keysight B1500A Semiconductor Device Parameter Analyzer: | ||
Current-Voltage (IV) measurement with 4 HRSMUs (High Resolution Source Monitor Units) | ||
Current range | : | ± 100 mA, measuring resolution 1 fA, sourcing resolution 5 fA |
Voltage range | : | ± 100 V, measuring resolution 0.5 μV, sourcing resolution 25 μV |