MSDS

msds

Before a new chemical or gas product can be used in the NFF, an MSDS (material safety data sheet) must be filled in for the product and submitted to NFF management for approval. A copy of the MSDS will then be stored in a yellow folder at four locations for easy access. The four locations are:

  1. The entrance to the corridor (Room 3232)
  2. Near wet station A in the class 1,000 area
  3. Near the Laser Direct Write System in the class 100 area (the "yellow area")
  4. NFF Enterprise Center plant room (Room 4163)

The aim of an MSDS is to provide users with information on:

  1. What the hazards of the product are
  2. How to use the product safely
  3. What to expect if the recommendations are not followed
  4. What to do if accidents occur
  5. How to recognize symptoms of overexposure
  6. What to do when overexposed

The MSDS contains eight categories of information:

  1. Product information: name of product, names, addresses and emergency phone number of the manufacturer and supplier
  2. Hazardous ingredients
  3. Physical data
  4. Fire or explosion data
  5. Reactivity data: information on the chemical instability of the product and the substances it may react with
  6. Toxicological properties: health effects
  7. Preventative measures
  8. First aid measures
Links to MSDS for the Chemicals used in the NFF Lab
Inorganic Chemicals Organic Chemicals Gases
Ammonium Hydroxide Acetone Ammonia
Acetic Acid IPA Argon
Cr Etchant AZ 1518 Photoresist Boron Trifluoride
Buffer Oxide Etchant, BOE AZ P4903 Photoresist Arsine
Ammonium Persulphate AZ 4620 Photoresist Chlorine
Hydrochloric Acid AZ 9260 Photoresist Hydrogen in Nitrogen
Tetramethylammonium Hydroxide, TMAH AZ 5206-E Photoresist Sulfur Hexafluoride
Freckle Etchant AZ 5214-E Photoresist Silane
Hydrofluoric Acid AZ 5200NJ Photoresist Dichlorosilane
Hydrogen Peroxide AZ 7908 Photoresist Germane
Iodine AZ MiR 703 Trifluoromethane
Potassium Iodide HPR-504 Photoresist Carbon Tetrafluoride
Sulfuric Acid HPR-506 Photoresist Hexafluoroethane
777 Etchant FH-6400L Photoresist Phosphine
Semi-Sperse 12, 25 Aqueous Dispersion Megaposit SPR660 Photoresist Phosphine in Silane
Semi-Sperse P1000 Aqueous Dispersion Microposit LOL 2000 Helium
Nitric Acid AZ 300 MIF Developer Nitrogen
Phosphoric Acid FHD-5 Developer Hydrogen
Potassium Hydroxide AZ 400K Developer Nitrogen Dioxide
Sodium Thiosulfate AZ 1500 Thinner Oxygen
  MEK  
  FH-ER  
  EKC265 Polymer Stripper  
  MS-2001 Photoresist Stripper  
  Hexamethyldisilazane, HMDS  
  SU8 Developer  
  SU8-2000 Series resists  
  SU8-3000 Series resists  
  Remover PG  
  ProTEK B3 Primer  
  ProTEK B3  
  ProTEK PSB-23  
  ProTEK PS Primer  
  Sylgrad 184 Silicone Elastomer, PDMS